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Uses of Random Copolymers

Categories:Industry trends
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Time of issue:2022-12-05 16:36
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(Summary description)Most of the currently developed copolymers are of this type, such as butadiene-styrene random copolymer (styrene-butadiene rubber), vinyl chloride-vinyl acetate copolymer, etc.

Random copolymer

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Uses of Random Copolymers

(Summary description)Most of the currently developed copolymers are of this type, such as butadiene-styrene random copolymer (styrene-butadiene rubber), vinyl chloride-vinyl acetate copolymer, etc.

Categories:Industry trends
Author:
Origin:
Time of issue:2022-12-05 16:36
Views:

Information

Most of the currently developed copolymers are of this type, such as butadiene-styrene random copolymer (styrene-butadiene rubber), vinyl chloride-vinyl acetate copolymer, etc.

Random copolymer factory

Random copolymerization usually destroys the symmetry and regularity of the chain, thereby reducing or even completely losing the crystallization ability. Whether random copolymers can be crystallized depends on the nature of the monomer components in the copolymer.
Random copolymers can be used as neutral layers in directed self-assembly lithography. Taking PS-b-PMMA as an example, unlike block copolymers, PS and PMMA of random copolymers are randomly arranged along the molecular chain skeleton, so its macroscopic surface energy is a function of its components, adjusting the The composition of PS and PMMA can render neutral to PS-b-PMMA. At the same time, there are often functional groups such as OH or HEMA on the end or branch of the molecular chain of the random copolymer, which are used to anchor the molecules on the substrate or cross-link with each other. Under high temperature conditions, the functional group in the random copolymer will react with the active group hydroxyl (OH) or carbonyl (C=O) on the surface of the silicon wafer to form a strong molecular covalent bond, the random copolymer It is connected to the surface of the substrate to form a neutral layer with a thickness of about 2-5 nm to achieve the neutralization effect of the substrate.

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